
PE-POLY, short for equipment for plasma-enhanced chemical vapor deposition of amorphous silicon poly films, generates plasma via glow discharge of high-frequency power supply to modulate the chemical vapor deposition process. It is mainly applied to the preparation of tunnel oxide layers, in-situ amorphous silicon and doped amorphous silicon films for cells in crystalline silicon solar cell manufacturing.
Equipment Features:
- Wafer capacity per tube: 768 pcs for M10 wafers / 616 pcs for M12 wafers
- Heating system: Integrated auxiliary heating on furnace body with multi-section independently controllable auxiliary heating design to boost throughput and film uniformity
- Discharge mechanism: Innovative moving electrode mechanism, reducing the failure rate of electrode paddles
- Innovative boat-pushing mechanism: Improves the rigidity of the boat-pushing system; paddle warpage deformation reduced by 20%, boat pushing speed increased by 30%
- Energy consumption: Adopts new thermal insulation materials and structure, achieving 10% energy saving per cell compared with the previous generation model
- Maintenance cycle: Proprietary patented insulation design extends the maintenance interval of reaction chamber components