
PECVD, namely Plasma Enhanced Chemical Vapor Deposition, is a device adopting the technology that uses glow discharge from high-frequency power supply to generate plasma to affect the chemical vapor deposition process. It can be matched with the self-developed stacked boat loader. It is mainly applied to the growth of anti-reflection coatings on the front and rear sides of cells in crystalline silicon solar cell manufacturing, for the preparation of films such as silicon nitride and silicon oxynitride.
Equipment Features:
- Wafer capacity per tube: 1368 pcs for M10 wafers / 1024 pcs for M12 wafers
- Reaction chamber: Adopts RedSun patented stacked-boat deposition film-forming technology, boosting reaction chamber utilization by 15%
- Capacity advantage: Single-tool capacity increased by 15%, up to 500 MW
- Operating cost advantage: Overall COO reduced by over 10%
- Stable performance: Adopts novel boat-pushing, moving electrode and gas inlet technologies to improve equipment stability and film uniformity