PECVD Coating Equipment

Product Detail

Introduction:

The plasma enhanced chemical vapor deposition equipment(PECVD) is a technology that produces plasma to influence the chemical vapor deposition process with high frequency glow discharge. It is mainly suitable for the growth of anti-reflection films on the front and back of the cells in the manufacture of crystalline silicon solar cells, such as the preparation of SiNx. SiOxNy and other film layers.




Features & Advantages:




Load per   tube	768 M10 SI   wafers/ 616 M12 SI wafers
Heating system	Furnace   body intergrated auxiliary heating, multi-stage,independent   controllable     auxiliary heating design, enhancing production capacity and film uniformity
Discharge   mechanism	New   motion type electrode mechanism, reducing eleetrode paddle jamming failure   rate
New boat   pushing mechanism	Enhancing   the rigidity of the pushing system, Reducing paddle warpage     deformation by 20%, and Increasing pushing speed by 30%
Energy   consumption	Utilizing   new Insulation materials and structures, saving 10% energy per cell compared   to the previous generation model
Dust   backfilling function	The   algorithm is used to judge the pump stop in advance to reduce abnormal stop   dust of the pump