
RF MATCH features high-speed, efficient, and highly stable matching performance, making it suitable for high-speed matching applications with stringent requirements.
Used in conjunction with RF power supplies, it is applicable to plasma etching, PECVD, RF sputtering, parallel plates, RF laser, ICP, RIE, CVD, PVD and other semiconductor and solar thin film processes.
Product Features
Millisecond-level response time and stable and continuous process control
Compatible with automatic and manual matching, offering higher reliability
Advanced RF power measurement system
L-type topology structure with a wider power range
Supports pulse working mode
Replaceable Products
AE Navigator
AE Navigator II
Technical Parameters
| Category | Parameter | Specification |
|---|---|---|
| Electrical Specifications | Operating Frequency | 13.56MHz±5% |
| AC Mains Input Voltage | AC 100V ~ 240V | |
| AC Mains Input Frequency | 50Hz ~ 60Hz | |
| AC Mains Input Current | 0.7A ~ 1.0A | |
| Maximum Transmission Power | 1500W | |
| Maximum RF Load Voltage | 5000Vpk | |
| Maximum RF Load Current | 40A RMS | |
| Matching Time | <1s at the preset position | |
| Post-matching Reflection Power | Less than 1% of the set power value | |
| Heat Dissipation & Environment Specifications | Cooling Method | Air cooling |
| Operating Temperature & Humidity | +5℃ ~ +40℃, 5% ~ 70% | |
| Size Specifications | Volume | 358 (D) × 368 (W) × 130 (H) mm |
| Topology Structure | L-type | |
| RF Input Interface | N female | |
| RF Output Interface | 7/16 female |